Tribromosilane

Tribromosilane
Names
	IUPAC name Tribromosilane
	Other names Silicobromoform; Tribromomonosilane
Identifiers
CAS Number	7789-57-3 ;
3D model (JSmol)	Interactive image;
ChemSpider	74222;
ECHA InfoCard	100.029.250
PubChem CID	82244;
UNII	H5DT3G5DA3 ;
CompTox Dashboard (EPA)	DTXSID50160668 ;
	InChI InChI=1S/Br3HSi/c1-4(2)3/h4H;
	SMILES Br[SiH](Br)Br;
Properties
Chemical formula	Br3HSi
Molar mass	268.805 g·mol−1
	Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa). Infobox references

Tribromosilane is a chemical compound containing silicon, hydrogen, and bromine. At high temperatures, it decomposes to produce silicon, and is an alternative to purified trichlorosilane of ultrapure silicon in the semiconductor industry.

The Schumacher Process of silicon deposition uses tribromosilane gas to produce polysilicon, but it has a number of cost and safety advantages over the Siemens Process to make polysilicon.[1]

It may be prepared by heating crystalline silicon with gaseous hydrogen bromide at high temperature.[2] It spontaneously combusts when exposed to air.[3]

References

The Schumacher Process
Schumb WC, Young RC (April 1930). "A study of the reaction of hydrogen bromide with silicon". Journal of the American Chemical Society. 52 (4): 1464–1469. doi:10.1021/ja01367a025.
Schumb WC (December 1942). "The Halides and Oxyhalides of Silicon". Chemical Reviews. 31 (3): 587–595. doi:10.1021/cr60100a004.

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[1] The Schumacher Process

[2] Schumb WC, Young RC (April 1930). "A study of the reaction of hydrogen bromide with silicon". Journal of the American Chemical Society. 52 (4): 1464–1469. doi:10.1021/ja01367a025.

[3] Schumb WC (December 1942). "The Halides and Oxyhalides of Silicon". Chemical Reviews. 31 (3): 587–595. doi:10.1021/cr60100a004.